DocumentCode :
1454567
Title :
3-D computer simulation of single-electron charging in silicon nanocrystal floating gate flash memory devices
Author :
Thean, A. ; Leburton, J.P.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Volume :
22
Issue :
3
fYear :
2001
fDate :
3/1/2001 12:00:00 AM
Firstpage :
148
Lastpage :
150
Abstract :
The operation of a silicon nanocrystal quantum-dot based flash memory device is simulated numerically with emphasis on energy and charge quantization in the quantum-dot. The simulation involves the self-consistent solution of three-dimensional (3-D) Poisson and Schrodinger-like equations, with the Slater rule for determining the charging voltage. We also compute the capacitance-voltage characteristics of the device and derive the threshold voltage, V/sub T/, variation with single-electron charging as a function of design parameters.
Keywords :
MOSFET; Poisson equation; Schrodinger equation; elemental semiconductors; flash memories; nanostructured materials; quantum interference devices; semiconductor device models; semiconductor quantum dots; silicon; MOSFET; Poisson equation; Schrodinger equation; Si; Slater rule; capacitance-voltage characteristics; charge quantization; charging voltage; energy quantization; floating gate flash memory device; nonvolatile memory; self-consistent model; silicon nanocrystal quantum dot; single electron charging; three-dimensional computer simulation; threshold voltage; Computational modeling; Computer simulation; Flash memory; Nanocrystals; Numerical simulation; Poisson equations; Quantization; Quantum dots; Silicon; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.910625
Filename :
910625
Link To Document :
بازگشت