An Adaptive-Tuning Scheme for G&P EWMA Run-to-Run Control

Author

Chang, Chun-Cheng ; Pan, Tian-Hong ; Wong, David Shan-Hill ; Jang, Shi-Shang

Author_Institution

Dept. of Chem. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan

Volume

25

Issue

2

fYear

2012

fDate

5/1/2012 12:00:00 AM

Firstpage

230

Lastpage

237

Abstract

Run-to-run (RtR) control is an important method for improving process capability. The most common form of RtR controllers are exponentially weighted moving average (EWMA) controllers. The performance of EWMA RtR controllers is affected by the values of the selected tuning parameter. In practice, the tuning parameter usually remains unchanged, resulting in suboptimal performance. In this paper, we propose an adaptive-tuning method for a group and product (G&P) EWMA controller to improve the control performance. The G&P EWMA controller is developed for mixed run processes. We show that the optimum-tuning parameters for the next run of this G&P EWMA controller are obtained online using a window of historical input-output data. The performance improvement due to the proposed method is demonstrated by a simulation example and an industrial application.

Keywords

adaptive control; moving average processes; process capability analysis; process control; semiconductor device manufacture; EWMA RtR controller; G&P EWMA run-to-run control; adaptive-tuning scheme; control performance; exponentially weighted moving average controller; group and product EWMA controller; mixed run process; optimum-tuning parameter; process capability; Adaptation models; Chemical engineering; Educational institutions; Estimation; Manufacturing; Process control; Tuning; Adaptive tuning; mixed run process; run-to-run control;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/TSM.2012.2188548

Filename

6156463