Title :
An Adaptive-Tuning Scheme for G&P EWMA Run-to-Run Control
Author :
Chang, Chun-Cheng ; Pan, Tian-Hong ; Wong, David Shan-Hill ; Jang, Shi-Shang
Author_Institution :
Dept. of Chem. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fDate :
5/1/2012 12:00:00 AM
Abstract :
Run-to-run (RtR) control is an important method for improving process capability. The most common form of RtR controllers are exponentially weighted moving average (EWMA) controllers. The performance of EWMA RtR controllers is affected by the values of the selected tuning parameter. In practice, the tuning parameter usually remains unchanged, resulting in suboptimal performance. In this paper, we propose an adaptive-tuning method for a group and product (G&P) EWMA controller to improve the control performance. The G&P EWMA controller is developed for mixed run processes. We show that the optimum-tuning parameters for the next run of this G&P EWMA controller are obtained online using a window of historical input-output data. The performance improvement due to the proposed method is demonstrated by a simulation example and an industrial application.
Keywords :
adaptive control; moving average processes; process capability analysis; process control; semiconductor device manufacture; EWMA RtR controller; G&P EWMA run-to-run control; adaptive-tuning scheme; control performance; exponentially weighted moving average controller; group and product EWMA controller; mixed run process; optimum-tuning parameter; process capability; Adaptation models; Chemical engineering; Educational institutions; Estimation; Manufacturing; Process control; Tuning; Adaptive tuning; mixed run process; run-to-run control;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2012.2188548