DocumentCode
1454720
Title
Demonstration of 1000-times switching of phase-change optical gate with Si wire waveguides
Author
Tanaka, Daiki ; Ikuma, Yuichiro ; Shoji, Yozo ; Kuwahara, Masashi ; Wang, Xiongfei ; Kintaka, Kenji ; Kawashima, Hitoshi ; Toyosaki, T. ; Tsuda, Hiroyuki
Author_Institution
Grad. Sch. of Sci. & Technol., Keio Univ., Yokohama, Japan
Volume
47
Issue
4
fYear
2011
Firstpage
268
Lastpage
269
Abstract
1000-times stable switching operation of an optical gate incorporating a Ge2Sb2Te5 thin film with Si wire waveguides is reported. The phase of the Ge2Sb2Te5 was reversibly changed from the amorphous state to the crystalline state by the application of pulsed laser irradiation. The extinction ratio was 9.7 dB on average, and did not decline throughout the entire sequence of 1000 switching events induced by irradiation. The wavelengths of the signal light and of the laser pulses were 1550 nm and 660 nm, respectively.
Keywords
laser beam effects; optical pulse generation; optical switches; optical waveguides; silicon; 1000-times switching; amorphous state; phase change optical gate; pulsed laser irradiation; wavelength 1550 nm; wavelength 660 nm; wire waveguides;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2010.3705
Filename
5716805
Link To Document