Title :
An InAlAs-InGaAs OPFET with responsivity above 200 A/W at 1.3-μm wavelength
Author :
Marso, M. ; Gersdorf, P. ; Fox, A. ; Forster, A. ; Hodel, U. ; Lambertini, R. ; Kordos, P.
Author_Institution :
Inst. fur Schicht- und Ionentech., Forschungszentrum Julich GmbH, Germany
Abstract :
The optoelectronic dc and RF behaviour of an InAlAs-InGaAs optically controlled field-effect transistor based on a high electron mobility transistor layer structure is investigated at 1.3-μm wavelength light. The device is backside-illuminated to increase the responsivity. A transistor with 0.3-μm gate length and an active area of 50×50 μm2 exhibits a responsivity of 235 A/W, at 11-μW incident optical power. The photoconductive response is higher than for an metal-semiconductor-metal photodetector with the same InGaAs absorption layer thickness up to 10 GHz.
Keywords :
electron mobility; infrared detectors; photoconductivity; photodetectors; phototransistors; /spl mu/W incident optical power; InAlAs-InGaAs OPFET; InAlAs-InGaAs optically controlled field-effect transistor; InGaAs absorption layer thickness; RF behaviour; active area; backside-illuminated; gate length; high electron mobility transistor layer structure; metal-semiconductor-metal photodetector; optoelectronic dc behaviour; photoconductive response; responsivity; transistor; Electron optics; FETs; HEMTs; Indium gallium arsenide; Lighting control; MODFETs; Optical control; Photoconducting materials; Photodetectors; Radio frequency;
Journal_Title :
Photonics Technology Letters, IEEE