DocumentCode :
1454999
Title :
On 1/f trapping noise in MOSTs
Author :
Kleinpenning, Theo G.M.
Author_Institution :
Dept. of Electr. Eng., Eindhoven Univ. of Technol., Netherlands
Volume :
37
Issue :
9
fYear :
1990
fDate :
9/1/1990 12:00:00 AM
Firstpage :
2084
Lastpage :
2089
Abstract :
New calculations are given for the 1/f noise in metal-oxide-semiconductor transistors (MOSTs) based on the McWhorter model (number fluctuations). Particular attention is paid to two regions of the drain current-voltage characteristic: weak inversion and near saturation. The results are at variance with previous theories, where some errors have been made. The gravest error was the violation of the physical law whereby the variance of the number of carriers N in the channel is ⩽N. The calculations do not give a divergent noise power at current saturation, as found by other authors. In the ohmic region, the relation between the spectral density of the drain current fluctuations and the number of carriers is determined. The Langevin method and the Klaassen-Prins method for calculating the 1/f noise in MOSTs are discussed and shown to have been used incorrectly when the mobility and the Hooge 1/f noise parameter depend on position in the channel
Keywords :
electron device noise; insulated gate field effect transistors; random noise; semiconductor device models; 1/f trapping noise; Hooge 1/f noise parameter; Klaassen-Prins method; Langevin method; MOSTs; McWhorter model; current saturation; divergent noise power; drain current fluctuations; drain current-voltage characteristic; mobility; near saturation; number fluctuations; ohmic region; weak inversion; Artificial intelligence; Boundary conditions; Circuit noise; Differential equations; Electric fields; Electron traps; Noise reduction; Threshold voltage; Tunneling; Voltage fluctuations;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.57173
Filename :
57173
Link To Document :
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