• DocumentCode
    1455602
  • Title

    Annealing effects on multi-quantum well laser diodes after proton irradiation

  • Author

    Zhao, Y.F. ; Schrimp, R.D. ; Patwary, A.R. ; Neifeld, M.A. ; Al-Johani, A.W. ; Weller, R.A. ; Galloway, K.F.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Vanderbilt Univ., Nashville, TN, USA
  • Volume
    45
  • Issue
    6
  • fYear
    1998
  • fDate
    12/1/1998 12:00:00 AM
  • Firstpage
    2826
  • Lastpage
    2832
  • Abstract
    The threshold current of multi-quantum well laser diodes increased by about 1.5 mA at a proton fluence of 6×1012 p/cm2. It recovered gradually due to forward-bias annealing at Ibias=35 mA and became about 0.8 mA less than before irradiation after 86 h of forward bias annealing. At the same time, the optical power at a given bias became greater than before irradiation. There is a fast recovery during the first 100 s after proton irradiation. Increasing the forward bias current during annealing speeds up the annealing process. The degradation of optical power at a proton flux of 1.87×109 p/cm2/s (4.7% at a fluence of 6×1012 p/cm2) is less than that at a proton flux of 1.45×1010 p/cm2/s (10.5% at a fluence of 6×1012 p/cm2) due to the in-situ forward-bias annealing effects
  • Keywords
    annealing; proton effects; quantum well lasers; 35 mA; 86 h; forward bias current; forward-bias annealing; multi-quantum well laser diodes; optical power; proton fluence; proton irradiation; threshold current; Annealing; Degradation; Diode lasers; Gallium arsenide; Optical refraction; Protons; Quantum well devices; Temperature; Thermal force; Threshold current;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.736535
  • Filename
    736535