• DocumentCode
    1457521
  • Title

    Analytical Modeling of Current Collapse in AlGaN/GaN HFETs According to the Virtual Gate Concept

  • Author

    Moradi, Mehdi ; Valizadeh, Pouya

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Concordia Univ., Montreal, QC, Canada
  • Volume
    10
  • Issue
    2
  • fYear
    2010
  • fDate
    6/1/2010 12:00:00 AM
  • Firstpage
    287
  • Lastpage
    294
  • Abstract
    GaN-based heterostructure field effect transistors (HFETs) have gained considerable attention in high-power microwave applications. So far, unsurpassed current levels and high output power at microwave frequencies have been achieved. However, the dominant factors limiting the reliability of these devices under high-power operation are still unsettled. Drain current collapse is one of the major encumbrances in the development of reliable high-power devices in this technology. In this paper, an accurate and versatile analytical model based on the concept of virtual gate formation due to the existence of acceptor-type surface states is developed to model the current-collapse phenomenon. The presented model is considerably simple, and at the same time, it is more precise than the other analytical models previously proposed in literature. The implementation of this analytical model demonstrates superb agreement with the experimental observations of permanent/semipermanent current collapse in AlGaN/GaN HFETs. To demonstrate the versatility, results of this model are also compared with an existing recently developed analytical model of comparable degree of complexity.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device reliability; AlGaN-GaN; HFET; acceptor-type surface states; analytical modeling; drain current collapse; heterostructure field effect transistor; high-power device; high-power operation; reliability; virtual gate; Analytical modeling; GaN; current collapse; heterostructure field effect transistor (HFET); surface traps;
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2010.2046739
  • Filename
    5439952