DocumentCode :
1457789
Title :
Influence of surface recombination on the burn-in effect in microwave GaInP/GaAs HBT´s
Author :
Borgarino, Mattia ; Plana, Robert ; Delage, Sylvain Laurent ; Fantini, Fausto ; Graffeuil, Jacques
Author_Institution :
Dipt. di Ingegneria dell´´Inf., Parma Univ., Italy
Volume :
46
Issue :
1
fYear :
1999
fDate :
1/1/1999 12:00:00 AM
Firstpage :
10
Lastpage :
16
Abstract :
In this paper, we report on the early increase of the dc current gain (burn-in effect) due to the electrical stress of carbon doped GaInP/GaAs heterojunction bipolar transistors (HBTs). Devices featuring different passivation layers, base doping, and emitter widths were investigated. The obtained data demonstrate that the burn-in effect is due to a reduction of the surface recombination located at the extrinsic base surface, around the emitter perimeter. It is concluded that the recombination centers are related to defects at the passivation/semiconductor interface and that, during the stress, they are passivated by hydrogen atoms released from C-H complexes
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; microwave bipolar transistors; passivation; semiconductor device reliability; surface recombination; GaInP-GaAs; base doping; burn-in effect; dc current gain; electrical stress; emitter perimeter; emitter widths; extrinsic base surface; microwave HBTs; passivation layers; recombination centers; surface recombination; Electrons; Gallium arsenide; Heterojunction bipolar transistors; Hydrogen; Lattices; Passivation; Radiative recombination; Semiconductor device doping; Spontaneous emission; Stress;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.737435
Filename :
737435
Link To Document :
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