DocumentCode :
1457913
Title :
Junction leakage characteristics in modified LOCOS isolation structures with a nitride spacer
Author :
Jang, Se-Aug ; Yeo, In-Seok ; Kim, Young-Bog
Author_Institution :
Semicond. Res. Div., Hyundai Electron. Ind. Co., Kyoungki, South Korea
Volume :
46
Issue :
1
fYear :
1999
fDate :
1/1/1999 12:00:00 AM
Firstpage :
145
Lastpage :
150
Abstract :
Junction leakage characteristics in modified local oxidation of silicon (LOCOS) isolation structures have been studied when a nitride spacer was used to prevent bird´s beak encroachment. Junction leakages with very low activation energy and strong voltage dependence were observed in the nitride spacered LOCOS. Comparative studies on the junction leakages of nonrecessed and recessed LOCOS have revealed that an additional silicon recess process after nitride spacer formation reduces the junction leakage current
Keywords :
isolation technology; leakage currents; oxidation; LOCOS isolation; activation energy; bird´s beak; junction leakage current; nitride spacer; silicon recess; voltage dependence; Degradation; Electric resistance; Etching; Leakage current; MOS devices; Oxidation; Semiconductor films; Silicon; Substrates; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.737453
Filename :
737453
Link To Document :
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