DocumentCode
1458308
Title
Nonlinear Optical Properties of Si Nanodot in
Matrix
Author
Anchala, Anchala ; Purohit, Shiv Prasad ; Mathur, Kailash Chandra
Author_Institution
Dept. of Phys. & Mater. Sci. & Eng., Jaypee Inst. of Inf. Technol., Noida, India
Volume
48
Issue
5
fYear
2012
fDate
5/1/2012 12:00:00 AM
Firstpage
628
Lastpage
634
Abstract
The linear and the third-order nonlinear optical properties associated with intersubband transitions are studied for spherical Si nanodot embedded in an amorphous matrix. The effect of radiation intensity and the change in the size of the dot are investigated on the nonlinear photoabsorption coefficient, refractive index change, and the third-order nonlinear optical susceptibility for transitions from ground state (1s-1p) and excited states (1p-1d, 2s-2p). The oscillator strength is also calculated for these transitions along with the photoelectric cross sections from the initial 1s and 2s states of the dot. It is noted that a decrease in the size of the dot leads to blue shift in peak positions of photoabsorption coefficient, refractive index change, and third-order nonlinear susceptibility involving transitions from the ground and excited states.
Keywords
excited states; ground states; nanostructured materials; nonlinear optical susceptibility; photoexcitation; refractive index; silicon; spectral line shift; Al2O3; Si; amorphous matrix; blue shift; excited states; ground state; intersubband transitions; nanodots; nonlinear optical properties; nonlinear photoabsorption coefficient; oscillator strength; photoelectric cross sections; radiation intensity; refractive index change; third-order nonlinear optical susceptibility; Aluminum oxide; Nonlinear optics; Optical refraction; Optical variables control; Quantum dots; Refractive index; Silicon; Nanodot; nonlinear; photoabsorption; photoelectric;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.2012.2189097
Filename
6158568
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