• DocumentCode
    1458626
  • Title

    Measurements of the Ion Species of Cathodic Arc Plasma in an Axial Magnetic Field

  • Author

    Oks, Efim M. ; Anders, André

  • Author_Institution
    High Current Electron. Inst., Tomsk, Russia
  • Volume
    39
  • Issue
    6
  • fYear
    2011
  • fDate
    6/1/2011 12:00:00 AM
  • Firstpage
    1272
  • Lastpage
    1276
  • Abstract
    Metal and gas ion species and their charge state distributions were measured for pulsed copper cathodic arcs in argon background gas in the presence of an axial magnetic field. It was found that changing the cathode position relative to anode and ion extraction system, as well as increasing the gas pressure, did not affect much the arc burning voltage and the related power dissipation. However, the burning voltage and power dissipation greatly increased as the magnetic field strength was increased. The fraction of metal ions and the mean ion charge state were reduced as the discharge length was increased. The observations can be explained by the combination of charge exchange collisions and electron impact ionization. They confirm that previously published data on characteristic material-dependent charge state distributions (e.g., Anders and Yushkov in 2002) are not universal but valid for high vacuum conditions and the specifics of the applied magnetic fields.
  • Keywords
    arcs (electric); charge exchange; electron impact ionisation; plasma collision processes; plasma pressure; plasma transport processes; arc burning voltage; axial magnetic field; cathodic arc plasma; charge exchange collision; electron impact ionization; gas ion species measurement; gas pressure; high vacuum condition; ion extraction system; material-dependent charge state distribution; mean ion charge state; metal ion species measurement; power dissipation; pulsed copper cathodic arcs; Argon; Cathodes; Ionization; Metals; Plasmas; Vacuum arcs; Arc discharges; magnetic field; plasma materials processing; plasma measurements; plasma sources; plasma transport processes;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2011.2106518
  • Filename
    5719629