DocumentCode :
1459402
Title :
Simulation study of a capacitively coupled plasma torch array
Author :
Koretzky, Edward ; Kuo, Spencer P.
Author_Institution :
Antenna Syst. Dept., TRW Space & Electron. Group, Redondo Beach, CA, USA
Volume :
29
Issue :
1
fYear :
2001
fDate :
2/1/2001 12:00:00 AM
Firstpage :
51
Lastpage :
56
Abstract :
Using capacitively coupled electrical discharges, an array of three plasma torches powered by a single 60-Hz source are lit up simultaneously to produce a dense plasma in the open air. The discharge voltage and current of each torch is measured for three cases of one to three torches being lit up in the array. The results determine the ν-i characteristic of the discharge which indicates that the torch is operating in a diffuse are mode. The torch array is modeled by an equivalent circuit for simulating its operation. The simulation results of the discharge voltage and current of a torch are shown to agree well with those from the experimental measurements for the three cases. The lump circuit model is then used to carry out numerical simulations of the discharge for a broad parameter space of plasma species. By fitting the simulation results, a function giving the parametric dependence of the consumed average power density ⟨P⟩ on the normalized average electron density ⟨ne⟩ maintained in the plasma is determined to be ⟨P⟩ 48 ⟨ne1.9α_0.4(W/cm3), where ⟨ne⟩ is normalized to 1013cm-3 and α_, the electron-ion recombination coefficient normalized to 10-7 cm3·s-1, is used as a variable parameter in the simulation
Keywords :
discharges (electric); plasma simulation; plasma torches; ν-i characteristic; capacitively coupled electrical discharges; capacitively coupled plasma torch array; dense plasma; discharge current; discharge voltage; electron-ion recombination coefficient; equivalent circuit; lump circuit model; normalized average electron density; numerical simulations; parametric dependence; plasma torches; power density; simulation study; Circuit simulation; Couplings; Current measurement; Fault location; Plasma density; Plasma measurements; Plasma properties; Plasma simulation; Plasma sources; Voltage;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.912941
Filename :
912941
Link To Document :
بازگشت