DocumentCode
146045
Title
Manufacturing of 3D integrated sensors and circuits
Author
Schrems, Martin ; Siegert, Joerg ; Dorfi, Peter ; Kraft, J. ; Stueckler, Ewald ; Schrank, Franz ; Selberherr, Siegfried
Author_Institution
ams AG, Unterpremstätten, Austria
fYear
2014
fDate
22-26 Sept. 2014
Firstpage
162
Lastpage
165
Abstract
3D integration of functions such as sensors and circuit elements enables miniaturized and cost-effective smart systems. Wirebonds are replaced by Through Silicon Vias (TSVs) and Wafer Level Packaging (WLP) for shorter conductive paths and reduced form factor. This paper reviews prior art and presents a comprehensive set of data from volume manufacturing of 3D integrated optical sensors and circuits using a “via last” manufacturing flow. 3D specific yield detracting processes such as patterning of open TSVs, wafer bonding, and etching are analyzed and discussed. Functional test yields equivalent to standard CMOS process yields can be achieved.
Keywords
CMOS integrated circuits; intelligent sensors; optical sensors; wafer bonding; wafer level packaging; 3D integrated circuits; 3D integrated optical sensors; 3D specific yield detracting processes; CMOS process; cost-effective smart systems; through silicon vias; wafer bonding; wafer level packaging; wirebonds; Manufacturing; Optical sensors; Silicon; Three-dimensional displays; Through-silicon vias; 3D integration; circuit; manufacturing; sensor; through silicon via; yield;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference (ESSDERC), 2014 44th European
Conference_Location
Venice
ISSN
1930-8876
Print_ISBN
978-1-4799-4378-4
Type
conf
DOI
10.1109/ESSDERC.2014.6948785
Filename
6948785
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