Title :
Using qualitative observations for process tuning and control [IC manufacture]
Author :
Spanos, Costas J. ; Chen, Raymond L.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fDate :
5/1/1997 12:00:00 AM
Abstract :
Many qualitative properties of the product and the process are of interest during semiconductor manufacturing. One of the typical examples is the sidewall surface roughness of an etched polysilicon line. These properties are important since they affect directly the quality and performance of the integrated circuit (IC) devices being built. Traditionally, however, they are treated informally and subjectively as tacit knowledge in the processing arena. In this paper, we present a systematic approach to modeling and controlling such qualitative properties. This approach is based on treating qualitative process variables as categorical data that can be better understood with the help of formal statistical analysis known as logistic regression. This analysis reveals important relationships between the input process settings and the qualitative process output responses in a way that is similar to linear regression analysis for conventional numerical variables. Similarly, categorical process variables can be used for process control, which is driven by a probabilistic model of the categorical variables. We show how categorical models can be used to tune a process and, later, to control it via statistical process control (SPC) charts, model-based quality control techniques, and adaptive run-by-run controllers
Keywords :
adaptive control; data analysis; integrated circuit manufacture; quality control; semiconductor process modelling; statistical analysis; statistical process control; SPC charts; adaptive run-by-run controllers; categorical data; categorical process variables; formal statistical analysis; input process settings; integrated circuit devices; logistic regression; model-based quality control techniques; modeling; probabilistic model; process control; process tuning; qualitative observations; qualitative process output responses; qualitative process variables; semiconductor manufacturing; statistical process control charts; Circuit optimization; Etching; Logistics; Manufacturing processes; Process control; Rough surfaces; Semiconductor device manufacture; Statistical analysis; Surface roughness; Surface treatment;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on