• DocumentCode
    146099
  • Title

    Impact of quantum modulation of the inversion charge in the MOSFET subthreshold regime

  • Author

    Hiblot, Gaspard ; Rafhay, Quentin ; Boeuf, F. ; Ghibaudo, Gerard

  • Author_Institution
    STMicroelectron., Crolles, France
  • fYear
    2014
  • fDate
    22-26 Sept. 2014
  • Firstpage
    286
  • Lastpage
    289
  • Abstract
    In this work, the impact of quantum modulation of the charge in the subtreshold regime is investigated for various architectures. Using Hänsch´s model, the reduction in threshold voltage roll-off induced by quantum effects in a double gate is investigated. Next, it is demonstrated with Poisson-Schrödinger simulations that there is a quantum-induced increase in sub-threshold swing for an InAs channel compared to a Si channel in a long-channel bulk device. Finally, a correction to the Bulk subthreshold swing classical model is proposed and validated on simulations. The results suggest that, contrary to double-gate devices, quantum modulation of the charge has an impact in the subthreshold regime for bulk architectures.
  • Keywords
    III-V semiconductors; MOSFET; Poisson equation; Schrodinger equation; indium compounds; semiconductor device models; Hänsch model; InAs; MOSFET subthreshold regime; Poisson-Schrödinger simulations; bulk subthreshold swing classical model; double gate; double-gate devices; inversion charge; long-channel bulk device; quantum effects; quantum modulation; subtreshold regime; threshold voltage roll-off; Doping; Equations; MOSFET; Mathematical model; Silicon; Threshold voltage; Bulk; Double-Gate; III-V; compact model; quantum effects; short-channel effects;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference (ESSDERC), 2014 44th European
  • Conference_Location
    Venice
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4799-4378-4
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2014.6948816
  • Filename
    6948816