DocumentCode :
1461919
Title :
Investigation of Substrate Surface Morphology Effects on Media Performance
Author :
Sung, Shang-Han ; Tan, An-Hung
Author_Institution :
Mech. Eng. Dept., Ching-Yun Univ., Jungli, Taiwan
Volume :
47
Issue :
3
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
528
Lastpage :
531
Abstract :
An advanced perpendicular magnetic recording (PMR) media requires continuous improvements in substrate surface morphology and defects counts in order to lower the fly height of a read/write head, reduce the yield loss related media defects, and improve the magnetic performance. A PMR media texturing process is a process used to remove asperities to generate a smoother and better quality surface without leaving circumferential textured patterns on the surface. We have developed a glass substrate mechanical texturing process, E process, using a fine texturing tape with a fiber size of 0.35 μm and small nano-cluster diamond (NCD) abrasive particles with a size of 12 nm. The E process produces a lower surface roughness Ra (from 0.21 to 0.06 nm) and results in the lowest glide avalanche (from 6.35 to 2.54 nm). These results indicate that a better quality media with low-defectivity can be obtained using the new developed mechanical texturing process. This process generates a very smooth surface with few textured scratches and adequate textured removal amount. A smoother substrate with a lower Ra leads to a narrower dispersion of rocking angle, Δθ50 of Co(0001), and half width of transition, TW50, and therefore resulting in improvements of OW and SNR.
Keywords :
glass; magnetic heads; perpendicular magnetic recording; slip; surface morphology; surface roughness; surface texture; PMR media texturing process; SiO2; advanced perpendicular magnetic recording media; circumferential textured patterns; defect counts; fiber size; fine texturing tape; fly height; glass substrate mechanical texturing process; glide avalanche; magnetic performance; media performance; read/write head; rocking angle dispersion; size 0.35 mum; size 12 nm; small nanocluster diamond abrasive particles; substrate surface morphology; surface roughness; textured removal; textured scratches; transition width; yield loss related media defects; Media; Rough surfaces; Substrates; Surface morphology; Surface roughness; Surface texture; Surface treatment; Defect; glide avalanche; magnetic performance; substrate surface morphology;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2011.2109373
Filename :
5721855
Link To Document :
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