• DocumentCode
    1461947
  • Title

    Single Wavelength Blue-Laser Optical Head-Like Opto-Mechanical System for Turntable Thermal Mode Lithography and Stamper Fabrication

  • Author

    Yang, Chin-Tien ; Chen, Chih-Yu ; Huang, Chun-Chieh ; Lee, Yuan-Chin ; Chen, Shuen-Chen ; Cheng, Chung-Ta

  • Author_Institution
    Electron. & Optoelectron. Res. Labs., Ind. Technol. Res. Inst., Hsinchu, Taiwan
  • Volume
    47
  • Issue
    3
  • fYear
    2011
  • fDate
    3/1/2011 12:00:00 AM
  • Firstpage
    701
  • Lastpage
    705
  • Abstract
    The characterization of novel small size 405 nm blue-laser optical head-like opto-mechanical system for turntable thermal mode lithography system that can provide high quality beam spot profile and real time high precision servo control and feasibility for thermal mode lithography process application are presented. The optical head-like opto-mechanical system consists of a single wavelength laser direct-write blue-laser opto-mechanical module and related servo control main board. An ideally narrow round shape exposure beam spot about 260 nm and high precision power control, focusing servo control are produced for thermal mode inorganic resist exposure. The small size opto-mechanical system combination with thermal mode lithography technology has been successfully applied to fabricate nickel stamper with submicro/nano structure patterns. The minimum pit (or hole) diameter is about 180 nm and ultra-low surface roughness (2 nm) is achieved after electroforming process.
  • Keywords
    micro-optics; microfabrication; optical fabrication; photolithography; electroforming process; high precision power control; servo control main board; single wavelength blue-laser optical head-like opto-mechanical system; single wavelength laser direct-write blue-laser opto-mechanical module; small size opto-mechanical system; stamper fabrication; thermal mode inorganic resist exposure; thermal mode lithography process application; thermal mode lithography technology; turntable thermal mode lithography; wavelength 180 nm; wavelength 405 nm; Focusing; Laser beams; Lithography; Measurement by laser beam; Resists; Semiconductor lasers; Servosystems; Blue-laser optical head; inorganic resist; lithography; nano-scale pattern; thermal mode lithography;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2010.2101585
  • Filename
    5721859