DocumentCode :
1462839
Title :
Blue-Light-Sensitive Phototransistor for Indirect X-Ray Image Sensors
Author :
Esmaeili-Rad, Mohammad R. ; Papadopoulos, Nikolas P. ; Bauza, Marius ; Nathan, Arokia ; Wong, William S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Waterloo, Waterloo, ON, Canada
Volume :
33
Issue :
4
fYear :
2012
fDate :
4/1/2012 12:00:00 AM
Firstpage :
567
Lastpage :
569
Abstract :
A thin-film phototransistor with a peak wavelength sensitivity of 420 nm was fabricated by integrating a bilayer hydrogenated-amorphous-silicon absorber with a nanocrystalline-silicon channel layer. The phototransistor response at λ = 420 nm was about 92 mA/W for an incident power density of 0.16 mW/cm2. A readout pixel circuit having a single transistor, acting as both the sensing and switching elements, is proposed to demonstrate the device potential for high-resolution pixelated X-ray imaging arrays. Simulation results reveal less than 150 μs to read out the pixel voltage with a storage capacitor of 1 pF. Thus, a frame rate of about 75 ms is predicted for a 500 × 500 pixel imaging array. Transient photocurrent measurements yield on (rise) and off (fall) times of 0.6 and 3 ms, respectively, verifying the requirements for a high frame rate.
Keywords :
X-ray imaging; amorphous semiconductors; elemental semiconductors; image sensors; nanostructured materials; phototransistors; silicon; thin film sensors; Si:H; X-ray imaging arrays; bilayer hydrogenated amorphous silicon absorber; blue light sensitive phototransistor; indirect X-ray image sensors; nanocrystalline silicon channel layer; readout pixel circuit; thin film phototransistor; transient photocurrent measurement; wavelength 420 nm; Photoconductivity; Phototransistors; Silicon; Switching circuits; Thin film transistors; Thin-film circuit; thin-film phototransistor;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2185676
Filename :
6164214
Link To Document :
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