DocumentCode :
1463636
Title :
Epitaxial silicon carbide for X-ray detection
Author :
Bertuccio, G. ; Casiraghi, R. ; Nava, F.
Author_Institution :
Dipt. di Elettronica e Inf., Politecnico di Milano, Italy
Volume :
48
Issue :
2
fYear :
2001
fDate :
4/1/2001 12:00:00 AM
Firstpage :
232
Lastpage :
233
Abstract :
We present the first experimental results of X-ray detection and spectroscopy by means of Schottky junctions on epitaxial silicon carbide (SiC). The devices have a junction area of 3 mm2 on an n-type 4H-SiC layer 30 μm thick with a dopant concentration of 1.8×10 cm at 300 K, the reverse current density of the best device varies between 2 pA/cm2 and 18 pA/cm2 as the mean electric field is increased from 40 kV/cm up to 170 kV/cm. The devices have been tested with X and γ rays from 241Am; the best measured energy resolution is 2.7 keV FWHM at room temperature
Keywords :
Schottky barriers; X-ray detection; X-ray spectroscopy; gamma-ray detection; semiconductor counters; semiconductor epitaxial layers; silicon compounds; γ ray detection; 300 K; 241Am; Am; Schottky junctions; SiC; X-ray detection; X-ray spectroscopy; energy resolution; epitaxial layer; mean electric field; reverse current density; room temperature; Current density; Energy measurement; Schottky diodes; Semiconductor diodes; Silicon carbide; Spectroscopy; Temperature; Testing; X-ray detection; X-ray detectors;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.915369
Filename :
915369
Link To Document :
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