Title :
Thermal-Mechanical Process Simulation of an Advanced NCF Technology
Author :
Cheng, Hsien-Chie ; Hwang, Wan-Yu ; Kao, Kuo Shu ; Tsang, Jimmy ; Yang, Sterling S. ; An, Chao-Chyun ; Chang, Simon M.
Author_Institution :
Dept. of Aerosp. & Syst. Eng., Feng Chia Univ., Taichung, Taiwan
Abstract :
The paper introduces an advanced nonconductive film (NCF) typed FC technology employing a novel compliant composite interconnect structure. The interconnect reliability and bondability of the technology are demonstrated through experimental thermal humidity (TH) test in conjunction with a two-point daisy chain resistance measurement. The alternative goal of the study aims to look into the insight of the thermal-mechanical behaviors of the novel packaging technology during NCF bonding process and thermal testing through numerical modeling and experimental validation. For effectively simulating the bonding process, a process-dependent finite-element (FE) simulation methodology is performed. The validity of the proposed methodology is verified through several experimental methods, including a Twyman-Green (T/G) interferometry technique for warpage measurement, and a four-point probe method for contact resistance measurement. At last, a design guideline for improved process-induced thermal-mechanical behaviors is presented through parametric FE analysis. Both numerical and experimental results demonstrate the feasibility in applying the novel compliant interconnects to achieve a proper contact stress at various temperature environments so as to hold a low and stable connection resistance at elevated temperature. Most importantly, the novel interconnects survive the 85degC/85%RH TH test for 500 hours.
Keywords :
contact resistance; electric resistance measurement; electronics packaging; finite element analysis; humidity; integrated circuit bonding; integrated circuit interconnections; integrated circuit packaging; integrated circuit reliability; interferometry; Twyman-Green interferometry technique; advanced NCF technology; advanced nonconductive film typed FC technology; compliant composite interconnect structure; contact resistance measurement; contact stress; four-point probe method; interconnect bondability; interconnect reliability; packaging technology; parametric FE analysis; process-dependent finite-element simulation methodology; process-induced thermal-mechanical behaviors; thermal humidity test; thermal-mechanical process simulation; two-point daisy chain resistance measurement; warpage measurement; Bonding processes; Contact resistance; Electrical resistance measurement; Humidity; Iron; Packaging; Paper technology; Temperature; Testing; Thermal resistance; Contact resistance measurement; Twyman–Green interferometry technique; finite-element (FE) modeling; flip chip; interconnect reliability; nonconductive film; process simulation;
Journal_Title :
Electronics Packaging Manufacturing, IEEE Transactions on
DOI :
10.1109/TEPM.2009.2030958