DocumentCode :
1464944
Title :
Dynamics of heavy-ion-induced latchup in CMOS structures
Author :
Aoki, Takahiro
Author_Institution :
NTT LSI Lab., Kanagawa, Japan
Volume :
35
Issue :
11
fYear :
1988
fDate :
11/1/1988 12:00:00 AM
Firstpage :
1885
Lastpage :
1891
Abstract :
Heavy-ion-particle-induced latchup phenomenon in CMOS parasitic p-n-p-n structures is analyzed using a two-dimensional transient device simulator. In the study, the dynamics of the latchup turn-on behavior in a conventional bulk structure are investigated in detail. Moreover, the relation between the terminal currents and the behavior of inner variables such as carriers and potential is also described. Relative latchup immunity for several device structures is also studied. From the points of the decoupling of the parasitic n-p-n and p-n-p transistors, which is the key factor for preventing latchup, the p--p+ epitaxial wafer with and without guard bands is discussed in comparison with the conventional structure
Keywords :
CMOS integrated circuits; integrated circuit technology; ion beam effects; CMOS parasitic p-n-p-n structures; dynamics; heavy-ion-induced latchup; latchup immunity; latchup turn-on behavior; p--p+ epitaxial wafer; parasitic transistors; terminal currents; two-dimensional transient device simulator; Analytical models; Charge carrier processes; Circuits; Guidelines; Large scale integration; Numerical simulation; Poisson equations; Semiconductor diodes; Single event upset; Thyristors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.7401
Filename :
7401
Link To Document :
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