DocumentCode :
1465192
Title :
Realization of Unidirectional Planar GaAs Nanowires on GaAs (110) Substrates
Author :
Dowdy, Ryan ; Walko, Donald A. ; Fortuna, Seth A. ; Li, Xiuling
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
Volume :
33
Issue :
4
fYear :
2012
fDate :
4/1/2012 12:00:00 AM
Firstpage :
522
Lastpage :
524
Abstract :
A self-aligned unidirectional planar GaAs nanowire (NW) array is realized by growing on (110) GaAs substrates through the Au-catalyzed vapor-liquid-solid mechanism. All NWs on (110) substrates propagate along the [00-1] direction, yielding planar NWs with trapezoidal cross sections where the top surface and sidewalls are identified by micro X-ray diffraction analysis to be [110], [010], and [100] facets, respectively. Depletion-mode long-channel metal-semiconductor field-effect transistors using these [00-1] GaAs NWs as channels exhibit well-defined dc output and transfer characteristics, confirming the high material quality of the NWs. Completely ordered site controlled arrays of planar NWs are demonstrated by growing on (110) substrates with Au catalyst nanoparticles patterned using electron beam lithography.
Keywords :
electron beam lithography; gallium arsenide; GaAs; depletion-mode long-channel metal-semiconductor field effect transistors; electron beam lithography; micro X-ray diffraction analysis; substrates; trapezoidal cross section; unidirectional planar nanowire array; vapor-liquid-solid mechanism; Arrays; Gallium arsenide; Gold; MESFETs; Nanoparticles; Nanowires; Substrates; GaAs; metal–semiconductor field-effect transistor (MESFET); nanowire (NW); nanowire array;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2186115
Filename :
6165635
Link To Document :
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