• DocumentCode
    1465365
  • Title

    Incidence Angle Effect of Energetic Carbon Ions on Deposition Rate, Topography, and Structure of Ultrathin Amorphous Carbon Films Deposited by Filtered Cathodic Vacuum Arc

  • Author

    Wang, N. ; Komvopoulos, K.

  • Author_Institution
    Dept. of Mech. Eng., Univ. of California, Berkeley, CA, USA
  • Volume
    48
  • Issue
    7
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    2220
  • Lastpage
    2227
  • Abstract
    The effect of the incidence angle of energetic carbon ions on the thickness, topography, and structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) was examined in the context of numerical and experimental results. The thickness of a-C films deposited at different incidence angles was investigated in the light of Monte Carlo simulations, and the calculated depth profiles were compared with those obtained from high-resolution transmission electron microscopy (TEM). The topography and structure of the a-C films were studied by atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. The film thickness decreased with the increase of the incidence angle, while the surface roughness increased and the content of tetrahedral carbon hybridization (sp3) decreased significantly with the increase of the incidence angle above 45°, measured from the surface normal. TEM, AFM, and XPS results indicate that the smoothest and thinnest a-C films with the highest content of sp3 carbon bonding were produced for an incidence angle of 45°. The findings of this study have direct implications in ultrahigh-density magnetic recording, where ultrathin and smooth a-C films with high sp3 contents are of critical importance.
  • Keywords
    Monte Carlo methods; X-ray photoelectron spectra; amorphous state; atomic force microscopy; bonds (chemical); carbon; explosives; magnetic recording; surface roughness; thin films; transmission electron microscopy; vacuum deposited coatings; AFM result; C; FCVA deposition method; Monte Carlo simulations; TEM results; X-ray photoelectron spectroscopy; XPS results; a-C films; atomic force microscopy; deposition rate; depth profiles; energetic carbon ions; film structure; film thickness; film topography; filtered cathodic vacuum arc deposition method; high-resolution transmission electron microscopy; incidence angle effect; microscopy; sp3 carbon bonding; sp3 content; surface normal; surface roughness; tetrahedral carbon hybridization; ultrahigh-density magnetic recording applications; ultrathin amorphous carbon films; Carbon; Films; Ions; Plasmas; Substrates; Surface topography; Surface treatment; Amorphous carbon; filtered cathodic vacuum arc; hybridization; structure; surface topography; ultrathin films;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2012.2190295
  • Filename
    6165663