DocumentCode :
1466151
Title :
Angle dependence of magnetoresistance peaks in thin nickel films
Author :
Rhee, Ilsu ; Kim, Chan
Author_Institution :
Dept. of Phys., Kyungpook Nat. Univ., Taegu, South Korea
Volume :
37
Issue :
2
fYear :
2001
fDate :
3/1/2001 12:00:00 AM
Firstpage :
1032
Lastpage :
1035
Abstract :
The angle dependence of magnetoresistance (MR) peaks in thin nickel films was investigated by rotating the sample in two different ways. The phase mixing of the positive M and negative MR signals was observed 1) with the sample located in the same plane as the field and rotated through an axis perpendicular to the field and 2) with the sample located in a plane perpendicular to the field and then rotated. In the latter case, the field difference between the two MR peaks increased. This behavior is well explained by the concept of effective magnetic field
Keywords :
ferromagnetic materials; magnetic thin films; magnetoresistance; nickel; AMR; Ni; angle dependence; effective magnetic field; ferromagnetic thin films; field difference; magnetoresistance peaks; phase mixing; Anisotropic magnetoresistance; Colossal magnetoresistance; Conductivity; Giant magnetoresistance; Magnetic films; Magnetization; Nickel; Pollution measurement; Shape; Substrates;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.917188
Filename :
917188
Link To Document :
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