• DocumentCode
    1466151
  • Title

    Angle dependence of magnetoresistance peaks in thin nickel films

  • Author

    Rhee, Ilsu ; Kim, Chan

  • Author_Institution
    Dept. of Phys., Kyungpook Nat. Univ., Taegu, South Korea
  • Volume
    37
  • Issue
    2
  • fYear
    2001
  • fDate
    3/1/2001 12:00:00 AM
  • Firstpage
    1032
  • Lastpage
    1035
  • Abstract
    The angle dependence of magnetoresistance (MR) peaks in thin nickel films was investigated by rotating the sample in two different ways. The phase mixing of the positive M and negative MR signals was observed 1) with the sample located in the same plane as the field and rotated through an axis perpendicular to the field and 2) with the sample located in a plane perpendicular to the field and then rotated. In the latter case, the field difference between the two MR peaks increased. This behavior is well explained by the concept of effective magnetic field
  • Keywords
    ferromagnetic materials; magnetic thin films; magnetoresistance; nickel; AMR; Ni; angle dependence; effective magnetic field; ferromagnetic thin films; field difference; magnetoresistance peaks; phase mixing; Anisotropic magnetoresistance; Colossal magnetoresistance; Conductivity; Giant magnetoresistance; Magnetic films; Magnetization; Nickel; Pollution measurement; Shape; Substrates;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.917188
  • Filename
    917188