DocumentCode :
1466939
Title :
A new triple-well resonant tunneling diode with controllable double-negative resistance
Author :
Mizuta, Hiroshi ; Tanoue, Tomonori ; Takahashi, Susumu
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
Volume :
35
Issue :
11
fYear :
1988
fDate :
11/1/1988 12:00:00 AM
Firstpage :
1951
Lastpage :
1956
Abstract :
A newly structured triple-well resonant tunneling diode (RTD) is proposed as a triple-valued logic device. The superiority of this new RTD for triple-valued logic application is demonstrated with numerical simulation based on the transfer matrix method. This new RTD exhibits significant double-negative differential resistance, and the two current peak voltages are independently controlled with well thicknesses. Comparing the numerical calculation and experimental data, it is shown that agreement between the calculation and experiment on the two current peak voltages is excellent
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; logic devices; negative resistance; ternary logic; tunnel diodes; GaAs-AlAs-AlGaAs; controllable double-negative resistance; current peak voltages; numerical simulation; transfer matrix method; triple-valued logic device; triple-well resonant tunneling diode; well thicknesses; Diodes; Electrons; Gallium arsenide; Logic devices; Numerical simulation; Resonance; Resonant tunneling devices; Thickness control; Voltage control; Wave functions;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.7409
Filename :
7409
Link To Document :
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