DocumentCode :
1471274
Title :
The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry
Author :
Kitson, S.C. ; Barnes, W.L. ; Sambles, J.R.
Author_Institution :
Dept. of Phys., Exeter Univ., UK
Volume :
8
Issue :
12
fYear :
1996
Firstpage :
1662
Lastpage :
1664
Abstract :
We report on the use of multiple-exposure optical interferometry combined with nonlinear development of photoresist to enable the fabrication of hexagonal arrays of dots. The capability of the technique is demonstrated by the fabrication of a hexagonal array of 50-nm-radius dots having a 300-nm periodicity.
Keywords :
arrays; diffraction gratings; integrated optics; light interferometry; optical fabrication; photoresists; substrates; 100 nm; 300 nm; diffraction gratings; hexagonal dot array; integrated optics; multiple-exposure optical interferometry; nm-radius dots; nonlinear development; periodicity; photoresist; submicron hexagonal array fabrication; Interference; Interferometers; Optical arrays; Optical device fabrication; Optical interferometry; Optical surface waves; Photonic band gap; Resists; Substrates; Surface topography;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.544711
Filename :
544711
Link To Document :
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