DocumentCode :
1471533
Title :
Charge transfer in a multi-implant pinned-buried photodetector
Author :
Janval, R.K. ; Misra, Durga ; Lowrance, John L.
Author_Institution :
Inst. of Technol., New Jersey Inst. of Technol., Newark, NJ, USA
Volume :
48
Issue :
5
fYear :
2001
fDate :
5/1/2001 12:00:00 AM
Firstpage :
858
Lastpage :
862
Abstract :
This work presents a charge transfer model for a multi-implant (graded) pinned-buried photodetector for high frame rate imaging applications. The model takes into account the initial charge of each implanted region which is divided into a large number of small areas and the maximum effective transit length of the far and near electrons by taking into account the fringing field effect due to graded implants under uniform illumination condition. The model predicts 1.5 μs for a single-implant and 500 ns for a three-implant photodetector for collection of 90% of the initial charge. The computed values agree well with the experimental results for a three-implant 70 μm×45 μm photodetector measured at a rate of 106 frames/s with uniform illumination by 100 ns LED pulses
Keywords :
CCD image sensors; ion implantation; photodetectors; semiconductor device models; 45 micron; 70 micron; charge readout time; charge transfer model; far electrons; fringing field effect; graded implants; high frame rate imaging; maximum effective transit length; multi-implant pinned-buried photodetector; near electrons; single-implant photodetector; thermal diffusion effect; three-implant photodetector; uniform illumination condition; Charge transfer; Electrons; Image sensors; Implants; Lighting; Optical imaging; Photodetectors; Pixel; Pulse measurements; Semiconductor process modeling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.918231
Filename :
918231
Link To Document :
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