Title :
Velocity distributions in magnetron sputter
Author :
Shon, C.H. ; Lee, J.K. ; Lee, H.J. ; Yang, Y. ; Chung, T.H.
Author_Institution :
Pohang Inst. of Sci. & Technol., South Korea
fDate :
12/1/1998 12:00:00 AM
Abstract :
Results of the particle simulation of magnetron sputter are presented. Using a kinetic code, we obtain the spatial profiles of plasma density, potential, and velocity distribution function, along with the electron temperature, the ion density, the current density, and the deposition profiles at the anode surface. The result of simulation is compared with the Child-Langmuir law applied to the magnetron discharge and the global model. The velocity distribution function of electrons is Maxwellian, but that of ions is non-Maxwellian near the cathode with the majority in the energy range below 50 eV
Keywords :
plasma density; plasma kinetic theory; plasma materials processing; plasma temperature; sputtering; 50 eV; Child-Langmuir law; Maxwellian electrons; anode surface; current density; deposition profiles; electron temperature; global model; ion density; kinetic code; magnetron discharge; magnetron sputter; nonMaxwellian ions; particle simulation; plasma density; potential; spatial profiles; velocity distribution function; velocity distributions; Anodes; Cathodes; Current density; Distribution functions; Electrons; Kinetic theory; Plasma density; Plasma temperature; Surface discharges; Temperature distribution;
Journal_Title :
Plasma Science, IEEE Transactions on
