Inductive plasma sources for plasma implantation and deposition

Author

Tuszewski, Michel ; Henins, Ivars ; Nastasi, Michael ; Scarborough, W. Kent ; Walter, Kevin C. ; Lee, Doug H.

Author_Institution

Los Alamos Nat. Lab., NM, USA

Volume

26

Issue

6

fYear

1998

fDate

12/1/1998 12:00:00 AM

Firstpage

1653

Lastpage

1660

Abstract

External and reentrant radio frequency inductive plasma sources are developed for plasma ion implantation and deposition processes in a 1.8 m³ vacuum vessel. Plasma densities in the range 10¹⁶-10¹⁷ m^-3 desirable for the above processes. External plasma sources could not yield the required plasma densities because of high particle losses in the transition region between the source and the main vessel. The particle losses are clarified through experiments and analysis, with and without multipole magnetic confinement. Reentrant plasma sources eliminate transmission losses and yield high plasma densities with good spatial uniformity

Keywords

ion implantation; plasma density; plasma deposition; plasma materials processing; plasma production; inductive plasma sources; multipole magnetic confinement; particle losses; plasma densities; plasma deposition; plasma ion implantation; radio frequency inductive plasma sources; spatial uniformity; Ion implantation; Plasma chemistry; Plasma confinement; Plasma density; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Plasma sheaths; Plasma sources; Radio frequency;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.747883

Filename

747883