DocumentCode :
1476029
Title :
Multiple-Port InP/InGaAsP Square-Resonator Microlasers
Author :
Che, Kai-Jun ; Yao, Qi-Feng ; Huang, Yong-Zhen ; Cai, Zhi-Ping ; Yang, Yue-De ; Du, Yun
Author_Institution :
Dept. of Electron. Eng., Xiamen Univ., Xiamen, China
Volume :
17
Issue :
6
fYear :
2011
Firstpage :
1656
Lastpage :
1661
Abstract :
Multiple-port semiconductor microlasers can be used as the light sources in photonic integrated circuits through on-chip waveguide connection. By directly jointing two and four coupling waveguides at vertices, two- and four-port electrically pumped InP/InGaAsP square-resonator microlasers are proposed and fabricated by standard photolithography and inductively coupled plasma etching techniques. The mode characteristics of square resonators with two and four coupling waveguides are investigated by 2-D finite-differences time-domain (FDTD) simulation. The influences of the thickness of insulating layer SiO2 and the width of coupling waveguides on the mode Q factors are studied for the square resonators laterally confined by an insulating layer SiO2 and p-electrode layers Ti/Au. Room-temperature continuous-wave operations are achieved for a square microlaser with a side length of 15 μm and two 1-μm-wide coupling waveguides at threshold current of 26 mA. In addition, a 20-μm-side microlaser connected with four 1-μm-wide bus waveguides is realized at 270 K. At last, the four-port square resonator with the same size as the fabricated lasers is studied by FDTD simulation, which yields the mode Q factors at the same magnitude as that measured result of 1.34 × 104.
Keywords :
III-V semiconductors; Q-factor; finite difference time-domain analysis; gallium arsenide; indium compounds; laser cavity resonators; laser modes; optical fabrication; optical pumping; photolithography; quantum well lasers; sputter etching; waveguide lasers; 2D finite-differences time-domain simulation; FDTD simulation; InP-InGaAsP; Q factors; bus waveguides; current 26 mA; electrical pumping; inductively coupled plasma etching; insulating layer; light sources; mode characteristics; multiple-port square-resonator microlasers; on-chip waveguide connection; p-electrode layers; photonic integrated circuits; room-temperature continuous-wave operations; semiconductor microlasers; size 1 mum; size 15 mum; standard photolithography; temperature 270 K; temperature 293 K to 298 K; threshold current; waveguide coupling; Finite difference methods; Indium phosphide; Optical resonators; Optical waveguides; Q factor; Semiconductor lasers; Waveguide lasers; Finite-differences time-domain (FDTD); InP/InGaAsP; metallically confined; multiple-port; square-resonator microlasers;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2011.2110639
Filename :
5735161
Link To Document :
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