DocumentCode :
1476174
Title :
Scaling of Hydrogen-Terminated Diamond FETs to Sub-100-nm Gate Dimensions
Author :
Moran, David A J ; Fox, Oliver J L ; McLelland, Helen ; Russell, Stephen ; May, Paul W.
Author_Institution :
Sch. of Eng., Univ. of Glasgow, Glasgow, UK
Volume :
32
Issue :
5
fYear :
2011
fDate :
5/1/2011 12:00:00 AM
Firstpage :
599
Lastpage :
601
Abstract :
We present the dc operation of hydrogen-terminated diamond field-effect transistors (FETs) with gate lengths of 1 μm to 50 nm. The 50-nm device metrics include a maximum drain current of 290 mA/mm and a peak extrinsic transconductance of 95 mS/mm. As the device gate length is reduced, peak intrinsic transconductance is increased substantially to a value of 650 mS/mm for the 50-nm device. A minimum Ion/Ioff ratio of ~ 1.5 × 104 is maintained at this reduced gate dimension. These results appear highly promising for the improvement of hydrogen-terminated diamond FET high-frequency performance through reduction of the device gate length to sub-100-nm dimensions.
Keywords :
diamond; field effect transistors; field-effect transistor; gate dimension; gate length; hydrogen-terminated diamond FET; maximum drain current; peak extrinsic transconductance; size 1 mum to 50 nm; size 100 nm; Diamond-like carbon; FETs; Logic gates; Ohmic contacts; Performance evaluation; Resistance; Transconductance; Diamond; field-effect transistor (FET); hydrogen terminated; scaling;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2114871
Filename :
5735184
Link To Document :
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