• DocumentCode
    1476274
  • Title

    Compact Virtual-Source Current–Voltage Model for Top- and Back-Gated Graphene Field-Effect Transistors

  • Author

    Wang, Han ; Hsu, Allen ; Kong, Jing ; Antoniadis, Dimitri A. ; Palacios, Tomas

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Massachusetts Inst. of Technol., Cambridge, MA, USA
  • Volume
    58
  • Issue
    5
  • fYear
    2011
  • fDate
    5/1/2011 12:00:00 AM
  • Firstpage
    1523
  • Lastpage
    1533
  • Abstract
    This paper presents a compact model for the current-voltage characteristics of graphene field-effect transistors (GFETs), which is based on an extension of the “virtual-source” model previously proposed for Si MOSFETs and is valid for both saturation and nonsaturation regions of device operation. This GFET virtual-source model provides a simple and intuitive understanding of carrier transport in GFETs, allowing extraction of the virtual-source injection velocity vVS, which is a physical parameter with great technological significance for short-channel graphene transistors. The derived I-V characteristics account for the combined effects of the drain-source voltage VDS, the top-gate voltage VTGS, and the back-gate voltage VBGS. With only a small set of fitting parameters, the model shows excellent agreement with experimental data. It is also shown that the extracted virtual-source carrier injection velocity for graphene devices is much higher than in Si MOSFETs and state-of-the-art III-V heterostructure FETs with similar gate length, demonstrating the great potential of GFETs for high-frequency applications. Comparison with experimental data for chemical-vapor-deposited GFETs from our group and epitaxial GFETs in the literature confirms the validity and flexibility of the model for a wide range of existing GFET devices.
  • Keywords
    MOSFET; elemental semiconductors; graphene; semiconductor device models; silicon; GFET virtual-source model; I-V characteristics; III-V heterostructure FET; MOSFET; Si; back-gated graphene field-effect transistors; carrier transport; chemical-vapor-deposited GFET; compact virtual-source current-voltage model; drain-source voltage; gate length; short-channel graphene transistors; top-gate voltage; virtual-source injection velocity; Charge carrier processes; Logic gates; MOSFETs; Semiconductor process modeling; Silicon; Spontaneous emission; Ambipolar transport; device model; graphene field-effect transistors (GFETs); virtual-source carrier injection velocity;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2118759
  • Filename
    5735198