DocumentCode :
1476956
Title :
An 8x 10-Gb/s Source-Synchronous I/O System Based on High-Density Silicon Carrier Interconnects
Author :
Dickson, Timothy O. ; Liu, Yong ; Rylov, Sergey V. ; Dang, Bing ; Tsang, Cornelia K. ; Andry, Paul S. ; Bulzacchelli, John F. ; Ainspan, Herschel A. ; Gu, Xiaoxiong ; Turlapati, Lavanya ; Beakes, Michael P. ; Parker, Benjamin D. ; Knickerbocker, John U. ;
Author_Institution :
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
47
Issue :
4
fYear :
2012
fDate :
4/1/2012 12:00:00 AM
Firstpage :
884
Lastpage :
896
Abstract :
A source synchronous I/O system based on high-density silicon carrier interconnects is introduced. Benefiting from the advantages of advanced silicon packaging technologies, the system uses 50 μm-pitch μC4s to reduce I/O cell size and fine-pitch interconnects on silicon carrier to achieve record-breaking interconnect density. An I/O architecture is introduced with link redundancy such that any link can be taken out of service for periodic recalibration without interrupting data transmission. A timing recovery system using two phase rotators shared across all bits in a receive bus is presented. To demonstrate these concepts, an I/O chipset using this architecture is fabricated in 45 nm SOI CMOS technology. It includes compact DFE-IIR equalization in the receiver, as well as a new all-CMOS phase rotator. The chipset is mounted to a silicon carrier tile via Pb-free SnAg μ C4 solder bumps. Chip-to-chip communication is achieved over ultra-dense interconnects with pitches of between 8 μm and 22 μm. 8 × 10-Gb/s data is received over distances up to 4 cm with a link energy efficiency of 5.3 pJ/bit from 1 V TX and RX power supplies. 8 × 9-Gb/s data is recovered from a 6-cm link with 16.3 dB loss at 4.5 GHz with an efficiency of 6.1 pJ/bit.
Keywords :
CMOS integrated circuits; elemental semiconductors; fine-pitch technology; integrated circuit interconnections; silicon; silicon-on-insulator; silver; solders; tin; /O cell size; I/O architecture; I/O chipset; SOI CMOS technology; Si; SnAg; all-CMOS phase rotator; bit rate 10 Gbit/s; chip-to-chip communication; compact DFE-IIR equalization; fine-pitch interconnects; frequency 4.5 GHz; high-density silicon carrier interconnects; link energy efficiency; link redundancy; loss 16.3 dB; periodic recalibration; receive bus; receiver; record-breaking interconnect density; silicon carrier tile; silicon packaging; size 45 nm; size 50 mum; solder bump; source-synchronous I/O system; timing recovery system; two phase rotator; ultra-dense interconnects; CMOS integrated circuits; Calibration; Clocks; Decision feedback equalizers; Integrated circuit interconnections; Receivers; Silicon; 3-D integration; DFE-IIR; Silicon interposer; chip-to-chip communication; link redundancy; phase rotator;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2012.2185184
Filename :
6173089
Link To Document :
بازگشت