• DocumentCode
    1476971
  • Title

    Improvement of the microwave properties of Y-Ba-Cu-O films with artificial defects

  • Author

    Wördenweber, Roger ; Lahl, Peter ; Einfeld, Jan

  • Author_Institution
    Inst. fur Schicht- und Ionentechnik, Forschungszentrum Julich GmbH, Germany
  • Volume
    11
  • Issue
    1
  • fYear
    2001
  • fDate
    3/1/2001 12:00:00 AM
  • Firstpage
    2812
  • Lastpage
    2815
  • Abstract
    In this paper, the potential of defects for optimizing the microwave properties of YBa2Cu3O7 (YBCO) thin films is demonstrated. On one hand, microscopic Y2O3 precipitates, which can be created in YBCO thin films by modification of the deposition process, serve as ideal scattering centres for quasiparticles and, thus, lead to a considerable reduction of the microwave surface resistance Rs. The modification Rs(T) can be explained in terms of the two-fluid model. Data for the quasiparticle scattering rate can be obtained from the measurements. On the other hand, the impact of artificial defects, so called antidots, upon the microwave properties is analyzed. Rs measurements demonstrate that the ion beam etching creates a -20 nm broad damaged area at the edge of the antidots. First measurements of the power handling capability of YBCO thin film resonators indicate that the magnetic contribution to the nonlinear behavior can be reduced by antidots. The implementation of antidots, which have been proven to be an ideal and easy tool to improve active YBCO thin film devices, might be of use for microwave applications as well
  • Keywords
    barium compounds; crystal defects; high-frequency effects; high-temperature superconductors; ion beam effects; quantum dots; quasiparticles; sputter etching; superconducting resonators; superconducting thin films; surface conductivity; yttrium compounds; YBa2Cu3O7; antidots; artificial defects; damaged area; deposition process modification; ideal quasiparticle scattering centres; ion beam etching; microscopic Y2O3 precipitates; microwave properties; microwave surface resistance; power handling capability; quasiparticle scattering rate; resonators; thin films; two-fluid model; Area measurement; Electrical resistance measurement; Ion beams; Magnetic analysis; Microscopy; Scattering; Sputtering; Surface resistance; Transistors; Yttrium barium copper oxide;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.919648
  • Filename
    919648