DocumentCode
1477142
Title
Y-Ba-Cu-O film growth on Y2O3 buffered and nonbuffered SrTiO3 single crystals using precursor films including fluoride
Author
Ichinose, A. ; Kikuchi, A. ; Tachikawa, K. ; Akita, S.
Author_Institution
Komae Res. Lab., Central Res. Inst. of Electr. Power Ind., Tokyo, Japan
Volume
11
Issue
1
fYear
2001
fDate
3/1/2001 12:00:00 AM
Firstpage
2913
Lastpage
2916
Abstract
A fluoride compound, BaF2, was used in the ex situ post-reaction process which was effective in the preparation of thick YBa2Cu3O7-x (YBCO) films over 1 micrometers for coated conductors. We investigated the YBCO film growth on SrTiO3 single crystal with and without Y2O3 buffer layers using BaF2. In order to suppress the reaction between the YBCO precursor films and the Y2O3 buffer layer, we controlled the atmospheric pressure and changed the evaporation materials to obtain precursor films which included fluoride. No water vapor was introduced during the heat treatment. The epitaxy c-axis oriented YBCO films, with 0.3 μm thickness, were successfully grown on both the Y2O3 buffered and nonbuffered SrTiO3 single crystals using Y, BaF2 and Cu as evaporation sources. We also deposited YBCO films on both substrates using evaporation sources, YF3, Ba and Cu. An appreciably different result has been obtained using YF3 compared to that using BaF2
Keywords
annealing; barium compounds; electron beam deposition; high-temperature superconductors; superconducting epitaxial layers; yttrium compounds; BaF2; HTSC; SrTiO3; SrTiO3 single crystals; Y-Ba-Cu-O film growth; Y2O3; Y2O3 buffer layer; YBa2Cu3O7; YF3; atmospheric pressure; coated conductors; electron beam deposition; epitaxy c-axis oriented YBCO films; evaporation materials; ex situ post-reaction process; fluoride; heat treatment; precursor films; preparation; thick YBa2Cu3O7-x films; Annealing; Buffer layers; Crystals; Hafnium; Laboratories; Magnetic films; Substrates; Telephony; Temperature; Yttrium barium copper oxide;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/77.919672
Filename
919672
Link To Document