DocumentCode
1477269
Title
Ion implantation in semiconductor device technology
Author
Stephen, J.
Volume
42
Issue
6
fYear
1972
fDate
6/1/1972 12:00:00 AM
Firstpage
265
Lastpage
283
Abstract
The role of ion implantation in the fabrication of semiconductor devices is reviewed with special reference to silicon planar technology. The applications of ion implantation to various devices is discussed in detail. A summary is given of the present state of the art in the compound semiconductor field.
Keywords
elemental semiconductors; ion implantation; semiconductor materials; silicon; ion implantation; semiconductor devices; silicon planar technology;
fLanguage
English
Journal_Title
Radio and Electronic Engineer
Publisher
iet
ISSN
0033-7722
Type
jour
DOI
10.1049/ree.1972.0044
Filename
5268237
Link To Document