• DocumentCode
    1477903
  • Title

    All-selective MOVPE-grown 1.3-μm strained multi-quantum-well buried-heterostructure laser diodes

  • Author

    Sakata, Yasutaka ; Hosoda, Tetsuya ; Sasaki, Yoshihiro ; Kitamura, Shotaro ; Yamamoto, Masaki ; Inomoto, Yasumasa ; Komatsu, Keiro

  • Author_Institution
    NEC Corp, Shiga, Japan
  • Volume
    35
  • Issue
    3
  • fYear
    1999
  • fDate
    3/1/1999 12:00:00 AM
  • Firstpage
    368
  • Lastpage
    376
  • Abstract
    Strained InGaAsP multi-quantum-well (MQW) double-channel planar-buried-hetero (DC-PBH) laser diodes (LDs) were fabricated by selective metalorganic-vapor-phase epitaxy (MOVPE). In the laser fabrication process, both the strained MQW active layer and current blocking structure were directly formed by selective MOVPE without any semiconductor etching process. The LDs are called all-selective MOVPE-grown BH LDs. The laser fabrication process can achieve both a precisely controlled gain waveguide structure and an excellent current blocking configuration, realizing the optimized DC-PBH structure. These aspects are essential to the high-performance and low-cost LD, which is strongly demanded for optical access network systems or fiber-to-the-home networks. This paper will show the excellent high-temperature characteristics for 1.3-μm Fabry-Perot LDs which have a record threshold current of 18 mA with a low-operation current of 56 mA for 10 mW, and 74 mA for 15 mW at 100°C with extremely high uniformity. Furthermore, reliable long-term operation at high temperature (85°C) and high-output power of 15 mW has been demonstrated for the first time
  • Keywords
    III-V semiconductors; MOCVD; gallium arsenide; gallium compounds; indium compounds; optical fabrication; quantum well lasers; semiconductor growth; vapour phase epitaxial growth; 1.3 mum; 1.3-μm Fabry-Perot LD; 1.3-μm strained multi-quantum-well buried-heterostructure laser diodes; 10 mW; 100 C; 15 mW; 18 mA; 56 mA; 74 mA; 85 C; InGaAsP; InGaAsP MQW double-channel planar-buried-hetero laser diodes; all-selective MOVPE-grown BH LD; all-selective MOVPE-growth; current blocking configuration; current blocking structure; excellent high-temperature characteristics; extremely high uniformity; fiber-to-the-home networks; high-output power; laser fabrication process; low-cost LD; low-operation current; optical access network systems; optimized DC-PBH structure; selective MOVPE; selective metalorganic-vapor-phase epitaxy; strained MQW active layer; Diode lasers; Epitaxial growth; Epitaxial layers; Etching; Optical device fabrication; Optical fiber networks; Optical waveguides; Quantum well devices; Semiconductor lasers; Waveguide lasers;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.748842
  • Filename
    748842