DocumentCode :
1478056
Title :
Performance limiting surface defects in SiC epitaxial p-n junction diodes
Author :
Kimoto, Tsunenobu ; Miyamoto, Nao ; Matsunami, Hiroyuki
Author_Institution :
Dept. of Electron. Sci. & Eng., Kyoto Univ., Japan
Volume :
46
Issue :
3
fYear :
1999
fDate :
3/1/1999 12:00:00 AM
Firstpage :
471
Lastpage :
477
Abstract :
Effects of surface defects on performance of kV-class 4H- and 6H-SiC epitaxial p-n junction diodes were investigated. The perimeter recombination and generation, instead of the bulk process, are responsible for forward recombination current and reverse leakage current of the diodes, respectively. Mapping studies of surface morphological defects have revealed that triangular-shaped defects severely degrade high-blocking capability of the diodes whereas shallow round pits and scratch give no direct impact. Device-killing defects in SiC epilayers are discussed based on breakdown voltage mapping. Effective minority carrier lifetimes are mainly limited not by bulk recombination but by perimeter recombination
Keywords :
carrier lifetime; minority carriers; p-n junctions; power semiconductor diodes; semiconductor device breakdown; semiconductor epitaxial layers; semiconductor materials; silicon compounds; surface recombination; 4H-SiC; 6H-SiC; SiC; SiC epitaxial p-n junction diode; breakdown voltage mapping; forward recombination current; high power device; minority carrier lifetime; perimeter generation; perimeter recombination; reverse leakage current; surface defect; Charge carrier lifetime; Current measurement; Degradation; Diodes; Epitaxial growth; Leakage current; P-n junctions; Silicon carbide; Substrates; Surface morphology;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.748864
Filename :
748864
Link To Document :
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