Title :
Growth of large area YBa2Cu3O7-x thin film by cylindrical hollow cathode sputtering
Author :
Suh, Jeong-Dae ; Han, Seok Kil ; Kang, Kwang Yong ; Kwak, Min Hwan
Author_Institution :
Electron. & Telecommun. Res. Inst., Taejon, South Korea
fDate :
3/1/2001 12:00:00 AM
Abstract :
We have deposited large area YBa2Cu3O7-x thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. X-ray diffraction analysis and scanning electron micrographs showed that the films are completely c-axis oriented. The variation of the thickness was less than 5% over the whole substrate. The values of microwave surface resistance were 1 mΩ at 25 K and 40 mΩ at 77 K and 19.6 GHz
Keywords :
X-ray diffraction; barium compounds; high-temperature superconductors; scanning electron microscopy; sputter deposition; superconducting thin films; surface conductivity; yttrium compounds; 25 K; 77 K; SEM; X-ray diffraction; YBa2Cu3O7; c-axis oriented films; cylindrical hollow cathode sputtering; large area thin film; microwave surface resistance; zero resistance temperature; Cathodes; Electrons; Geometry; Magnetic flux; Sputtering; Substrates; Surface discharges; Telephony; Temperature; Yttrium barium copper oxide;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
