• DocumentCode
    1478952
  • Title

    Access-Region Defect Spectroscopy of DC-Stressed N-Polar GaN MIS-HEMTs

  • Author

    Sasikumar, A. ; Arehart, A. ; Kolluri, S. ; Wong, M.H. ; Keller, S. ; DenBaars, S.P. ; Speck, J.S. ; Mishra, U.K. ; Ringel, S.A.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Ohio State Univ., Columbus, OH, USA
  • Volume
    33
  • Issue
    5
  • fYear
    2012
  • fDate
    5/1/2012 12:00:00 AM
  • Firstpage
    658
  • Lastpage
    660
  • Abstract
    Distinct trap levels in the drain access regions of an N-polar GaN MIS-HEMT are investigated before and after semi-on dc stressing by thermal and optical trap spectroscopies. The most prominent dc stress effect was an increase in concentration of a pre-existing electron trap with an activation energy of 0.54 eV, accompanied by a decrease in concentration of an electron trap with a 0.65-eV activation energy. These distinct states had similar concentrations before stressing, with the 0.54-eV trap concentration dominating (by 6×) after stress. Deeper states revealed via optical measurements showed a mild ~20% increase in total concentration after stressing.
  • Keywords
    III-V semiconductors; MIS devices; electron traps; gallium compounds; high electron mobility transistors; infrared spectroscopy; wide band gap semiconductors; DC-stressed N-polar GaN MIS-HEMT; GaN; access-region defect spectroscopy; activation energy; distinct trap level; drain access region; electron trap; electron volt energy 0.54 eV; electron volt energy 0.65 eV; optical measurement; optical trap spectroscopy; semi-on dc stressing; thermal trap spectroscopy; Degradation; Electron traps; Gallium nitride; HEMTs; Logic gates; Spectroscopy; Stress; Constant current deep level optical spectroscopy (CID-DLOS); GaN; N-polar; constant current deep level transient spectroscopy (CID-DLTS); dc stressing; deep levels; high-electron-mobility transistor (HEMT); metal-organic chemical vapor deposition (MOCVD); trapping;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2188710
  • Filename
    6175102