Multilayered Monolithic Silicon Photonic Crystals

Author

Mallick, Shrestha Basu ; Jung, Il Woong ; Meisner, Aaron M. ; Provine, J. ; Howe, Roger T. ; Solgaard, Olav

Author_Institution

Dept. of Appl. Phys., Stanford Univ., Stanford, CA, USA

Volume

23

Issue

11

fYear

2011

fDate

6/1/2011 12:00:00 AM

Firstpage

730

Lastpage

732

Abstract

In this letter, we describe the fabrication of double-layered self-aligned silicon photonic crystals (PCs) using directional and isotropic etches. The double-layer PCs represent a step towards practical 3-D PCs based on standard Si processing, and they have several advantageous characteristics compared to single-layer PCs, including higher reflectivity and sharper resonances, as demonstrated both experimentally and by finite-difference time-domain (FDTD) simulations.

Keywords

elemental semiconductors; etching; finite difference time-domain analysis; optical multilayers; photonic crystals; reflectivity; silicon; 3-D photonic crystals; FDTD simulations; Si; directional etches; double-layered self-aligned silicon photonic crystals; finite-difference time-domain simulations; isotropic etches; multilayered monolithic silicon photonic crystals; reflectivity; Broadband communication; Fabrication; Lattices; Photonic crystals; Reflectivity; Silicon; Three dimensional displays; Broadband mirror; monolithic photonic crystals (PCs); photonic crystal (PC) devices; photonic crystal (PC) fabrication; silicon photonic crystal (PC) technology;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2011.2132698

Filename

5739100