DocumentCode :
1482188
Title :
Parameter extraction method for universal amorphous silicon thin-film transistors simulation program with integrated circuit emphasis model
Author :
Jin, Jong W. ; Oudwan, M. ; Daineka, Dmitri ; Moustapha, O. ; Bonnassieux, Yvan
Author_Institution :
LPICM, Ecole Polytech., Palaiseau, France
Volume :
6
Issue :
2
fYear :
2012
fDate :
3/1/2012 12:00:00 AM
Firstpage :
118
Lastpage :
121
Abstract :
The universal simulation program with integrated circuit emphasis (SPICE) model for hydrogenated amorphous silicon thin-film transistor is largely used in circuit simulation. This model has more than 10 parameters to be extracted through experimental data, and the optimal method to determine them is still open to discussion. In this study, the authors propose a new method for the extraction of the main above-threshold regime parameters. This method can be used regardless of the resistance value between the channel and the source-drain. The parameters extracted with this method are less sensitive on experimental data selection than the ones obtained through conventional methods. In addition, these parameters successfully describe the experimental data.
Keywords :
SPICE; amorphous semiconductors; circuit simulation; elemental semiconductors; hydrogenation; semiconductor thin films; silicon; thin film transistors; Si; above-threshold regime parameters extraction; circuit simulation; experimental data selection; hydrogenated amorphous silicon thin-film transistors SPICE model; simulation program with integrated circuit emphasis model; source-drain channel;
fLanguage :
English
Journal_Title :
Circuits, Devices & Systems, IET
Publisher :
iet
ISSN :
1751-858X
Type :
jour
DOI :
10.1049/iet-cds.2011.0124
Filename :
6177332
Link To Document :
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