• DocumentCode
    1482311
  • Title

    High-efficiency (>20% AM0) GaAs solar cells grown on inactive-Ge substrates

  • Author

    Iles, P.A. ; Yeh, Yea-chuan M. ; Ho, F.H. ; Chu, Chaw-Long ; Cheng, C.

  • Author_Institution
    Appl. Solar Energy Corp., City of Industry, CA, USA
  • Volume
    11
  • Issue
    4
  • fYear
    1990
  • fDate
    4/1/1990 12:00:00 AM
  • Firstpage
    140
  • Lastpage
    142
  • Abstract
    Results showing successful formation of high-efficiency GaAs cells (over 20% efficiency air mass zero (AM0)) grown on inactive Ge substrates under production conditions are discussed. The growth conditions varied considerably from those previously considered essential for good-quality heteroepitaxial growth. This work opens the way for the near-future implementation of large-area, lightweight, high-efficiency solar cells on spacecraft arrays. High-quality heteroepitaxial layers can be grown over a wider range of deposition conditions than previously used. Growth conditions that minimize the interaction of the grown layers and the substrate can be used. This is an advantage in growing monolithic cascade cells, particularly with cell structures that use optimized bottom cells as the substrate for epitaxial growth of the top cell. One combination being tested is the growth of an AlGaAs cell (with low concentration of Al) on a previously completed Ge cell.<>
  • Keywords
    III-V semiconductors; gallium arsenide; semiconductor epitaxial layers; semiconductor growth; solar cells; vapour phase epitaxial growth; 20 percent; AlGaAs cell; GaAs-Ge; III-V semiconductors; MOCVD; deposition conditions; efficiency air mass zero; epitaxial growth; growth conditions; heteroepitaxial layers; high efficiency cells; inactive Ge substrates; large area lightweight cells; monolithic cascade cells; optimized bottom cells; solar cells; spacecraft arrays; Gallium arsenide; Mass production; P-n junctions; Photovoltaic cells; Solar power generation; Space vehicles; Substrates; Temperature; Testing; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.61775
  • Filename
    61775