• DocumentCode
    1482715
  • Title

    High-performance GaAs MESFETs fabricated on misoriented

  • Author

    Lo, Y.H. ; Harbison, J. ; Abeles, Joseph H. ; Lee, Tien Pei ; Nahory, Robert E.

  • Author_Institution
    Bell Commun. Res., Red Bank, NJ, USA
  • Volume
    9
  • Issue
    8
  • fYear
    1988
  • Firstpage
    383
  • Lastpage
    384
  • Abstract
    MBE (molecular-beam-epitaxially)-grown GaAs MESFETs with 1.3 mu m gate length were fabricated on a
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor growth; solid-state microwave devices; 1.3 micron; 11 GHz; DC; GaAs; InP; MBE; MESFETs; cutoff frequency; heteroepitaxy; microwave characteristics; misoriented; transconductance; Cutoff frequency; Gallium arsenide; Indium phosphide; MESFETs; Microwave devices; Molecular beam epitaxial growth; Optical films; Optoelectronic devices; Semiconductor films; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.751
  • Filename
    751