DocumentCode :
1482721
Title :
Very-high-speed silicon-on-sapphire integrated circuits
Author :
Phillips, D.H. ; Kinell, D.K. ; Girton, D.G. ; Kitajewski, L.
Volume :
49
Issue :
11
fYear :
1979
fDate :
11/1/1979 12:00:00 AM
Firstpage :
581
Lastpage :
586
Abstract :
Very-high-speed silicon-on-sapphire (s.o.s.) n¿channel m.o.s.f.e.t.s have been fabricated which demonstrated a maximum oscillating frequency of approximately 6-4 GHz. These m.o.s.f.e.t.s¿test transistors on an integrated circuit¿were fabricated with a process which can be used to fabricate high¿speed integrated circuits. Spacecraft data processing requirements are evolving to indicate the need for very-high-speed devices which are capable of being integrated into large¿scale circuits. Improvements in high-speed data processing communications systems are badly needed. Many of these applications will be met be very-high-speed s.o.s.integrated circuits.
Keywords :
field effect integrated circuits; silicon on sapphire integrated circuits;
fLanguage :
English
Journal_Title :
Radio and Electronic Engineer
Publisher :
iet
ISSN :
0033-7722
Type :
jour
DOI :
10.1049/ree.1979.0104
Filename :
5269129
Link To Document :
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