A novel illuminator design in a rapid thermal processor

Author

Lee, Min Hung ; Liu, Chee Wee

Author_Institution

Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan

Volume

14

Issue

2

fYear

2001

fDate

5/1/2001 12:00:00 AM

Firstpage

152

Lastpage

156

Abstract

The instantaneous insertion of an opaque shutter between the lamp arrays and the wafer in a rapid thermal processor can significantly increase the ramp-down rate from 90 to 400°C/s during the cooling period. This shutter can prevent the residual heating of lamp filament as well as the self-heating from the reflector due to the mirror image of the wafer. To compensate for the weak irradiation intensity close to the edge of the linear lamps, a multiplane reflector design is used to increase the uniformity of irradiation intensity in the direction along the linear lamps. The distance between the reflector plane and the linear lamp is designed to be smaller at the edge, as compared to the center, of the linear lamp. Together with two oblique reflectors at the ends of the linear lamps, a typical three-plane reflector design can increase the uniformity by 60% in a typical lamp configuration

Keywords

cooling; lamps; rapid thermal processing; cooling period; illuminator design; irradiation intensity; lamp arrays; lamp filament; mirror image; multiplane reflector design; oblique reflectors; opaque shutter; ramp-down rate; rapid thermal processor; reflector plane; residual heating; self-heating; weak irradiation intensity; Cooling; Fluid flow; Geometry; Heating; Helium; Implants; Lamps; Mirrors; Rapid thermal processing; Temperature;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.920726

Filename

920726