DocumentCode
1485435
Title
A systematic study of a-CNx overcoat film for proximity recording
Author
Zhang, Bing ; Wei, Bo ; Sullivan, Daniel J D ; Gotts, Hugh E.
Author_Institution
MaxMedia Div., Hyundai Electron. America, San Jose, CA, USA
Volume
33
Issue
5
fYear
1997
fDate
9/1/1997 12:00:00 AM
Firstpage
3109
Lastpage
3111
Abstract
This paper takes a systematic approach to study the correlation between the film growth processes and mechanical properties of amorphous carbon nitride overcoat films for proximity recording. The film properties were characterized by resistivity measurements, Raman spectroscopy, Auger and XPS depth profiling, and high resolution XPS scans of C1s and N1s core level bond energies. Results from these characterization methods can be correlated to the sputtering process parameters and the tribological scratch performance of the films
Keywords
Auger effect; Raman spectra; X-ray photoelectron spectra; amorphous state; carbon compounds; electrical resistivity; hard discs; hardness testing; magnetic recording; mechanical properties; sputtered coatings; thin films; tribology; wear resistant coatings; Auger depth profiling; CN; N; Raman spectroscopy; XPS depth profiling; a-CNx overcoat film; amorphous CN films; characterization methods; film growth processes; film properties; high resolution XPS scans; mechanical properties; proximity recording; resistivity measurements; sputtering process parameters; thin-film recording media; tribological scratch performance; Amorphous materials; Bonding; Conductivity measurement; Disk recording; Electric resistance; Electric variables measurement; Etching; Mechanical factors; Nitrogen; Raman scattering; Spectroscopy; Sputtering; Substrates; Surface resistance;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.617860
Filename
617860
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