FeNi and Ti underlayers for vertical recording on rigid disks

Author

Jeanniot, D.

Author_Institution

Bull SA, Les Clayes-sous-Bois

Volume

24

Issue

6

fYear

1988

fDate

11/1/1988 12:00:00 AM

Firstpage

2356

Lastpage

2358

Abstract

FeNi and Ti underlayers on CoCr disks are studied. It is confirmed that the structure of FeNi thin films is derived from pure Ni cfc structure. Soft magnetic films can be achieved when sputtering conditions are optimized for an Fe2ONi80 target. Sputtering conditions were also studied for Ti layers. It was found that Ti thin films crystallize in the hcp structure. An (002) crystallographic preferred orientation was generally observed, but it can be improved for thinner films and when high cathode voltage is used during deposition. A (100) orientation is observed if high bias voltage is applied to the substrate during deposition. Both structures, when used as underlayers, improve the vertical anisotropy of CoCr, but (100) Ti underlayers lead to a higher vertical anisotropy

Keywords

chromium alloys; cobalt alloys; hard discs; magnetic anisotropy; magnetic recording; sputtered coatings; CoCr; FeNi; Ti underlayers; bias voltage; cathode voltage; crystallographic preferred orientation; hcp structure; rigid disks; sputtering conditions; vertical anisotropy; vertical recording; Amorphous magnetic materials; Anisotropic magnetoresistance; Magnetic anisotropy; Magnetic properties; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Saturation magnetization; Soft magnetic materials; Sputtering; Voltage;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.92108

Filename

92108