• DocumentCode
    1487196
  • Title

    V_{\\rm th} Shift in Single-Layer Graphene Field-Effect Transistors and Its Correlation With Raman Inspection

  • Author

    Liu, W.J. ; Sun, X.W. ; Tran, X.A. ; Fang, Z. ; Wang, Z.R. ; Wang, F. ; Wu, L. ; Zhang, J.F. ; Wei, J. ; Zhu, H.L. ; Yu, H.Y.

  • Author_Institution
    Sch. of EEE, Nanyang Technol. Univ., Singapore, Singapore
  • Volume
    12
  • Issue
    2
  • fYear
    2012
  • fDate
    6/1/2012 12:00:00 AM
  • Firstpage
    478
  • Lastpage
    481
  • Abstract
    Raman measurement is carried out to understand Vth shift in single-layer graphene field-effect transistors (GFETs). The G (2D) peak shift in Raman spectra is correlated to the corresponding ΔVth during stress and recovery phases. A blue (red) shift of G and 2D peaks is seen during stress (recovery) phase, indicating the corresponding trapping (detrapping) effects in the graphene device. It is interesting to note that, after forming gas annealing (H2/Ar), the defects can be generated in graphene (evidenced by D peak of Raman spectra), leading to the increased ΔVth for both negative bias temperature instability and positive bias temperature instability in single-layer GFETs.
  • Keywords
    field effect transistors; graphene; stability; Raman inspection; Vth Shift; gas annealing; negative bias temperature instability; positive bias temperature instability; recovery phases; single-layer GFET; single-layer graphene field-effect transistors; trapping effects; Annealing; Charge carrier processes; FETs; Logic gates; Semiconductor device measurement; Stress; Stress measurement; Graphene field-effect transistors (GFETs); Raman; negative bias temperature instability (NBTI); positive bias temperature instability (PBTI);
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2012.2190414
  • Filename
    6179326