DocumentCode :
1487196
Title :
V_{\\rm th} Shift in Single-Layer Graphene Field-Effect Transistors and Its Correlation With Raman Inspection
Author :
Liu, W.J. ; Sun, X.W. ; Tran, X.A. ; Fang, Z. ; Wang, Z.R. ; Wang, F. ; Wu, L. ; Zhang, J.F. ; Wei, J. ; Zhu, H.L. ; Yu, H.Y.
Author_Institution :
Sch. of EEE, Nanyang Technol. Univ., Singapore, Singapore
Volume :
12
Issue :
2
fYear :
2012
fDate :
6/1/2012 12:00:00 AM
Firstpage :
478
Lastpage :
481
Abstract :
Raman measurement is carried out to understand Vth shift in single-layer graphene field-effect transistors (GFETs). The G (2D) peak shift in Raman spectra is correlated to the corresponding ΔVth during stress and recovery phases. A blue (red) shift of G and 2D peaks is seen during stress (recovery) phase, indicating the corresponding trapping (detrapping) effects in the graphene device. It is interesting to note that, after forming gas annealing (H2/Ar), the defects can be generated in graphene (evidenced by D peak of Raman spectra), leading to the increased ΔVth for both negative bias temperature instability and positive bias temperature instability in single-layer GFETs.
Keywords :
field effect transistors; graphene; stability; Raman inspection; Vth Shift; gas annealing; negative bias temperature instability; positive bias temperature instability; recovery phases; single-layer GFET; single-layer graphene field-effect transistors; trapping effects; Annealing; Charge carrier processes; FETs; Logic gates; Semiconductor device measurement; Stress; Stress measurement; Graphene field-effect transistors (GFETs); Raman; negative bias temperature instability (NBTI); positive bias temperature instability (PBTI);
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2012.2190414
Filename :
6179326
Link To Document :
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