DocumentCode :
148771
Title :
Multilayered Sn/Ag3Sn electroplating on Cu alloys for high reliable electronic/electric materials
Author :
Song-Zhu Kure-Chu ; Ogasawara, T. ; Yashiro, Hitoshi ; Ye Rongbin ; Hhosokai, Takuya ; Uchidate, Michimasa ; Suziki, Eiichi ; Naito, Tomoyuki
Author_Institution :
Fac. of Eng., Iwate Univ., Morioka, Japan
fYear :
2014
fDate :
23-25 April 2014
Firstpage :
168
Lastpage :
172
Abstract :
We report a multilayered Sn/Ag film electroplated on Cu alloys with high reliability as promising coating materials for LED lead-frames and for electric connectors. The multilayered Sn/Ag films consisted of an Ag-Sn alloy film with 30-80 nm-thick as Ag3Sn phase covered on a 1 μm-thick Sn film on Cu alloy substrates. The as-deposited Sn/Ag3Sn films exhibited a high specular reflectivity around 70% at the wavelengths of 480 nm, which was lower than a commercial bright Ag film with total reflectivity of 90% but much higher than a commercial bright Au film in 24% at the same wavelength. It was found through an accelerated sulfuring test that, the reflectivity of the Sn/Ag3Sn films was almost unchanged even after immersing in a 0.2% (NH4)2Sx solution for 60 min, compared to the abrupt decrease to 15% for the conventional Ag film even after immersing for 10 min. The excellent sulfuring resistance and durability of the multilayered Sn/Ag3Sn films can be attributed to the existence of a stable SnO2 film existed on the surface of Ag3Sn alloy, which was revealed by a UPS analysis in a vacuum chamber by heating at 473 - 673 K, thus protecting underneath Ag3Sn alloy film and inhibiting the chemical reaction of Ag and S2- ions.
Keywords :
copper alloys; durability; electric connectors; electroplated coatings; light emitting diodes; multilayers; reflectivity; reliability; silver alloys; solders; thin films; tin alloys; ultraviolet photoelectron spectra; LED lead-frames; SnAgCu; UPS analysis; accelerated sulfuring test; chemical reaction; coating materials; electric connectors; high reliable electronic-electric materials; multilayered electroplating; multilayered film durability; size 1 mum; size 30 nm to 80 nm; sulfuring resistance; temperature 473 K to 673 K; time 10 min; time 60 min; vacuum chamber; wavelength 480 nm; Films; Lead; Light emitting diodes; Mirrors; Reflectivity; Resistance heating; Ag3Sn; Sn; electrodeposition; multilayer; reflectivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging (ICEP), 2014 International Conference on
Conference_Location :
Toyama
Print_ISBN :
978-4-904090-10-7
Type :
conf
DOI :
10.1109/ICEP.2014.6826683
Filename :
6826683
Link To Document :
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